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China factory High Purtiy Hcds 99.9% Si2cl6 Hexachlorodisilane

Shanghai Kemike Chemical Co.,Ltd
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China factory High Purtiy Hcds 99.9% Si2cl6 Hexachlorodisilane

Certification : COA

Place of Origin : China

Brand Name : CMC

Model Number : Si2cl6

MOQ : 1kg

Price : US $40/kg

Payment Terms : L/C, T/T

Supply Ability : 100t/Year

Delivery Time : 15 days

Packaging Details : Cylinder/Tank

Product Name : Hexachlorodisilane

Model No. : Si2cl6

Transport : by Sea

Purity : 99.9%

Transport Package : Cylinder

Specification : 40L, 200L

Trademark : CMC

Origin : China

HS Code : 2812190091

CAS No. : 7783-82-6

Formula : Si2cl6

EINECS : 7783-82-6

Constituent : Industrial Pure Air

Grade Standard : Industrial Grade

Chemical Property : Poisonous Gases

Customization : Available | Customized Request

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Product Description

Hexachlorodisilane (Si2Cl6) is an inorganic compound consisting of two silicon (Si) atoms bonded together with six chlorine (Cl) atoms. It is a colorless gas that is primarily used as a precursor in the production of silicon-based materials. Here are some key points about hexachlorodisilane gas:

  1. Structure and Properties: Hexachlorodisilane has a tetrahedral molecular structure, with each silicon atom bonded to three chlorine atoms and the other silicon atom. It is a volatile and reactive compound, and its boiling point is around 140 °C.

  2. Synthesis and Production: Hexachlorodisilane is typically synthesized by the reaction of silicon tetrachloride (SiCl4) with elemental silicon (Si) or silicon powder at high temperatures. It can also be produced through the reaction of silicon with chlorine gas (Cl2).

  3. Applications:

    • Semiconductor Industry: Hexachlorodisilane is a crucial precursor in the production of various silicon-based thin films for the semiconductor industry. It is used in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to deposit silicon-containing layers with high purity and uniformity.

    • Silicon Nitride Production: Hexachlorodisilane can be used as a precursor for the synthesis of silicon nitride (Si3N4) ceramics. It reacts with ammonia (NH3) to form silicon nitride, which is used in the manufacturing of ceramics, cutting tools, and protective coatings.

    • Surface Modification: Hexachlorodisilane is employed as a surface treatment agent to modify the surface properties of materials. It can enhance hydrophobic or hydrophilic characteristics, improve adhesion, or provide chemical resistance to surfaces.

  4. Safety Considerations: Hexachlorodisilane is a highly reactive and volatile compound. It is corrosive to metals and can cause severe burns upon contact with the skin or eyes. It is also toxic if inhaled or ingested. Proper handling, storage, and personal protective equipment should be used when working with hexachlorodisilane or any other hazardous chemicals.

Hexachlorodisilane gas is an important precursor in the semiconductor industry and the production of silicon-based materials. Its reactivity and ability to deposit high-quality silicon films make it valuable for various technological applications. However, it should be handled with caution due to its hazardous properties.

Basic Info.

Model NO. Si2Cl6 Grade Standard Electron Grade
Transport Package Cylinder, Canister Specification 40L, 200L
Trademark CMC Origin Suzhou, China
HS Code 2812190091 Production Capacity 100t/Year


Specifications:

IUPAC name Hexachlorodisilane
Other names Disilicon hexachloride
Identifiers
CAS No.: 13465-77-5
EC No.: 236-704-1
Properties
Molecular Formula: Si2Cl6
Molar mass: 268.88 g/mol
Appearance: Colorless liquid
Melting point: ≤20 °C
Boiling point: 144 °C (291 °F; 417 K)
Flash point: >93°C
Vopor density(Air=1): >1
Relative density(Water=1): 1.562


Sample Test:
Test Items Units Specifications Test Result
Assay by GC wt% ≥99.9 99.905
Li ng/g ≤0.5 <0.05
Na ng/g ≤0.5 <0.05
Mg ng/g ≤0.5 <0.05
Al ng/g ≤1.0 0.35
K ng/g ≤0.5 0.08
Ca ng/g ≤0.5 0.16
Ti ng/g ≤1.0 0.18
Cr ng/g ≤0.5 <0.05
Mn ng/g ≤0.5 <0.05
Fe ng/g ≤1.0 0.48
Co ng/g ≤0.5 <0.05
Ni ng/g ≤0.5 0.06
Cu ng/g ≤0.5 <0.05
Zn ng/g ≤0.5 <0.05
Detailed Photos

China factory High Purtiy Hcds 99.9% Si2cl6 HexachlorodisilaneChina factory High Purtiy Hcds 99.9% Si2cl6 HexachlorodisilaneChina factory High Purtiy Hcds 99.9% Si2cl6 Hexachlorodisilane

China factory High Purtiy Hcds 99.9% Si2cl6 HexachlorodisilaneChina factory High Purtiy Hcds 99.9% Si2cl6 Hexachlorodisilane


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